Technique and Technical Textiles at SpinExpo
New textile techniques and innovations in technical textiles are on the agenda at SpinExpo’s slate of seminars planned for the upcoming show in New York.
On July 19, Stoll Software Solutions will present a demonstration of its exclusive partnership with Eneas Informatica sRl, a patternmaking software solution for knits. Stoll will also present the latest in technical textile applications on July 21. The Knit Resource Center will present new developments in a presentation on July 20. And Woolmark will introduce new Merino wool products at a seminar on July 20.
Now in its second run in New York, SpinExpo was founded eight years ago in Shanghai. The Shanghai show features nearly 200 exhibitors from 16 countries, including fiber manufacturers, knitters and circular knit machinery manufacturers, spinners, and trend forecasters.
Attendees in Shanghai include such well-known international manufacturers and retailers as Inwear, Marimekko, Petit Bateau, Gerard Darel, Armani Jeans, Gruppo Coin, Stefanel, Uniqlo, Mango, Zara, Burberry, Marks & Spencer, Ann Taylor, Coldwater Creek, American Eagle, Urban Outfitters and John Varvatos. The New York show was launched as the request of U.S. manufacturers who wanted a second show, in New York, where they could bring more design-team members and spend more time with exhibitors, according to show organizers.
The New York show is set for July 19–21 at the Metropolitan Pavilion and Altman Building in New York. For more information, visit www.spinexpo.com.—Alison A. Nieder
